发明名称 MANUFACTURE OF COMPOUND SEMICODUCTOR THIN FILM
摘要 PURPOSE:To simplify the structure of peripheral equipments of a reaction tube, facilitate the vacuum shield in the reaction tube, and prevent the permeation of matal into the reaction tube, by a method wherein generated forces during the reaction in the reaction tube is used to rotate a susceptor. CONSTITUTION:On a support made of quartz glass 6, a susceptor holder 7 capable of ratating is installed, on which a susceptor 8 and a substrate 9 are set. Several blades of a propeller 10 are fixed to the susceptor holder 7 with an inclination angle of 40-50 degrees with respect to a gas flow. The gas after reaction and before reaction collides against the propeller 10, which is rotated by the gas pressure. In order that the surplus friction may not generate at this time between the support 6 and the susceptor holder 7, a hole 11 in the form of a semisphere is drilled on the back side of a sample holder, and a tip of the support is formed in semispherical 12 in order that the sample holder and the support may make a point contact. The inclination of the propeller to a gas flow and the number of propeller blades are determined according to the flow speed of gas to be employed.
申请公布号 JPS62232118(A) 申请公布日期 1987.10.12
申请号 JP19860074809 申请日期 1986.04.01
申请人 SEIKO EPSON CORP 发明人 MUTO RIEKO
分类号 H01L21/205 主分类号 H01L21/205
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