发明名称 CHEMICAL COPPER PLATING SOLUTION
摘要 PURPOSE:To prolong the service life of a chemical copper plating soln. by adding an ionic surfactant to the plating soln. so as to prevent the deterioration of the plating soln. due to the accumulation of alkali metallic salts during repeated use. CONSTITUTION:A cationic surfactant such as cetyltrimethylammonium chloride or dodecylpyridinium chloride is added to a chemical copper plating soln. contg. bivalent copper ions such as copper sulfate as a base, a complexing agent for bivalent copper ions, a reducing agent for bivalent copper ions, a pH adjusting agent, a complexing agent for univalent copper ions and a polyoxyethylene type nonionic surfactant as essential components. The amount of the cationic surfactant added is 50mg per 1l plating soln. Even when the resulting plating soln. is repeatedly used, the coagulation of the nonionic surfactant due to the accumulation of the Na salts of sulfuric acid and formic acid is inhibited, preventing the deterioration of the performance of the plating soln., and shortering of the service life of the plating soln.
申请公布号 JPS6026671(A) 申请公布日期 1985.02.09
申请号 JP19830134328 申请日期 1983.07.25
申请人 HITACHI SEISAKUSHO KK 发明人 OKA HITOSHI;KIKUCHI HIROSHI;MATSUO AKIRA
分类号 C23C18/38;C23C18/40 主分类号 C23C18/38
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