发明名称 THIN FILM PRODUCING DEVICE
摘要 PURPOSE:To efficiently form thin film on a substrate with a small-sized and compact device by the film-like substrate in plural pieces of reaction chambers disposed around a central differential discharge chamber via said chamber through slits in common use as differential discharge holes. CONSTITUTION:An intake chamber 2, a cleaning chamber 3, reaction chambers 4I-4III and take-out chamber 5 are disposed around the central differential discharge chamber 1 of a polygonal shape segmented to the plural divided discharge chambers 1A-1E by radial partition walls 8. The film-like substrate FB un-wound from a feed roll 11 in the chamber 2 is successively passed by guide rollers 19, 20 in the discharge chambers 1A-1E, then through the chambers 3, 4I-4III provided with film forming rolls 12 contg. heaters H and RF electrodes 14. After the surface of the substrate is cleaned and is formed with the film in the above-mentioned manner, the substrate is taken up on a taking-up roll 13 in the take-out chamber 5. The slits 6 to allow the passage of the substrate FB in common use as the differential discharge holes for both chambers are provided between the central differential discharge chamber 1 and the chambers 2-5.
申请公布号 JPS62230983(A) 申请公布日期 1987.10.09
申请号 JP19860074598 申请日期 1986.03.31
申请人 HAMAKAWA YOSHIHIRO;SHIMADZU CORP 发明人 HAMAKAWA YOSHIHIRO;TAI MASAHIKO
分类号 C23C14/24;C23C14/34;C23C14/56;C23C16/48;C23C16/50;C23C16/54;C23C28/00 主分类号 C23C14/24
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