发明名称 TARGET FOR MAGNETRON SPUTTERING
摘要 PURPOSE:To improve the efficiency of utilization of a ferromagnetic material in a target by forming the parts of the target confronting the magnetic poles of a magnetron with a thick ferromagnetic material and the other part with a thick nonmagnetic material. CONSTITUTION:The parts of a plate-shaped target confronting the magnetic poles M of a magnetron are formed with only a thick ferromagnetic material 3a, or with the material 3a and a thin nonmagnetic material 4b. The other part is formed with only a thick nonmagnetic material 4a, or with the material 4a and a thin ferromagnetic material 3b. The nonmagnetic materials 4 exert no unfavorable influence on the sputtering of the ferromagnetic materials 3. Accordingly, the proportion of the ferromagnetic materials 3 remaining after sputtering without consuming to the whole target is reduced. The efficiency of utilization of the ferromagnetic materials 3 is improved and the service life of the target can be prolonged.
申请公布号 JPS62230968(A) 申请公布日期 1987.10.09
申请号 JP19860074052 申请日期 1986.03.31
申请人 MITSUBISHI METAL CORP 发明人 HIJIKATA KENICHI;SATO KAZUYUKI;FURUHASHI RIYOUKO
分类号 C23C14/34;C23C14/35;C23C14/36 主分类号 C23C14/34
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