| 摘要 |
PURPOSE:To facilitate manufacture and to enhance a yield rate, by forming a Iight-transmitting protective insulation film comprising the same material in continuation with an interlayer insulating film between the first and second wiring interconnections constituting a matrix interconnection on a photo-conductive cell array. CONSTITUTION:An insulating substrate 1 is, e.g., a glass substrate. A photocon-ductive film 2 is an a-Si:H film comprising a high resistance layer 2a and a low resis tance layer 2b. A photoconductive cell array 5 is divided into a plurality of groups. Counter electrodes 3 on one side are commonly connected by a common electrode 6 for every group. Counter electrodes 4 on the other side are common ly connected by a matrix interconnection 7. The matrix interconnection 7 is composed of first interconnections 8, which are connected to the counter electrodes 4' second interconnection 9 intersecting the interconnections 8, and an interlayer insulating film 10 between the interconnections 8 and 9. The interconnections 8 and 9 are connected through hole parts 11 At this time, a protective insulation film 12, which has the same material as the interlayer insulating film 10, is formed by extending the interlayer insulating film 10. |
