发明名称 THIN-FILM DEPOSITION METHOD
摘要 PURPOSE:To make it possible to deposite fine particles excellently and to bury them even in a groove having a high aspect ratio, by charging the fine particles, which are deposited on a substrate, and imparting a potential, whose polaritiy is reverse with respect to that of the fine particles, to the substrate, on which the particles are deposited. CONSTITUTION:A substrate 1 is mounted on an electrode 10, which faces an electrode 9 that is grounded in a vacuum container 30. A positive potential is applied from a power source 11. Meanwhile, in order to obtain fine particles as spieces to be deposited, a fine particle source 15 in a crucible 13 is heated by a heater 12 and vaporized. Electrons (e) are supplied in the vicinity of the many yielded fine particles from an electron gun 16 in a shower state. Thus the many yielded fine particles 14 are charged as a whole. in this way, charged fine particles 8 are yielded. The fine particles 8, which are negatively charged, are accelerated with an electric field E between the parallel electrodes and projected on the substrate 1 vertically.
申请公布号 JPS62229844(A) 申请公布日期 1987.10.08
申请号 JP19860070785 申请日期 1986.03.31
申请人 TOSHIBA CORP 发明人 SEKINE MAKOTO;OKANO HARUO
分类号 H01L21/314;H01L21/205 主分类号 H01L21/314
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