| 摘要 |
<p>A fluid application system which is useful for the subjection of substantially planar objects to various fluids for cleaning, etching, photoresist developing and the like. The system includes a chamber which has at least one agitation mechanism. The agitation mechanism includes an orificed plate positioned on one side of one or more of the planar objects. Means are provided for moving the fluid through the orificed plate with a pulsating motion. The agitation mechanism can either be substantially within the chamber or form one or more of the sides of the chamber. The agitation mechanism includes in addition to the orificed plate, a pneumatic chamber, a fluid chamber, a flexible diaphragm between the pneumatic and fluid chambers, and a piston being movable within the agitation mechanism to force the fluid through the orificed plate with the pulsating motion.</p> |
