发明名称 DEVELOPING METHOD FOR PHOTOSENSITIVE PLANOGRAPHIC PLATE AND ITS PROCESSOR
摘要 PURPOSE:To stably perform development to improve the workability of management of a developer by providing a developer temporary storage tank in a position higher than a developing part and naturally dropping the developer to a material to develop in the developing part to supply it there. CONSTITUTION:An exposed photosensitive planographic plate (PS plate) is sent to a developing part A by a roll 1. A developer temporary storage tank 10 is provided above the developing part A, and the developer is dropped onto the PS plate from supply ports 7 arranged in the breadthwise direction of the PS plate. The developer is replenished from a developer tank 11 to the tank 10 through a pump 14. At such a time, a float switch 16 is provided for the tank 10 make a water level 9 constant. The developer on the PS plate is rubbed with a brush 6 to make the developer film thickness uniform, and the development is performed. Next, the PS plate is washed with water in a water washing part B. Since the fresh developer is supplied to the developing part A, the development is always stably performed.
申请公布号 JPS62229249(A) 申请公布日期 1987.10.08
申请号 JP19860071303 申请日期 1986.03.31
申请人 KONIKA CORP 发明人 NOGAMI AKIRA;UEHARA MASABUMI;KIYONO MINORU;NAKANO MIEJI
分类号 G03F7/30;(IPC1-7):G03F7/00 主分类号 G03F7/30
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