| 摘要 |
PURPOSE:To ensure a satisfactory etching shape and dimensional reproducibility of the width of lines by adding a gaseous hydrocarbon to a principal etching gas and carrying out etching with the resulting dry etching gas. CONSTITUTION:An etching mask 6 is placed on a material 5 to be etched on a base 4 and the material 5 is dry etched. At this time, a gaseous hydrocarbon such as ethane, ethylene, acetylene, propane or propylene is added to a principal etching gas by about 1-70vol% and the resulting dry etching gas is used. A polymer 10 of the hydrocarbon sticks to the surface of the mask 6 and acts as a protective film during etching. The etching resistance of the mask 6 is improved, a satisfactory etching shape and dimensional reproducibility are ensured and the degree of freedom during the setting of etching conditions is increased.
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