| 摘要 |
PURPOSE:To form deposited films having always stable electrical, optical and photoconductive characteristics by installing plural pieces of substrates to be formed with the deposited films as a substrate assembly on a substrate susceptor provided with apertures. CONSTITUTION:The substrate 102 is imposed on the susceptor 101 for the substrates to be formed with the films, which susceptor is penetrated with the apertures 103 for gas outflow, to form the substrate assembly. Such substrate assemblies are spaced 104 at specified intervals from each other and are disposed in the film forming space. A gaseous raw material and gaseous halogen oxidizing agent are introduced into the reaction space and are brought into contact with each other to form the plural precursors including the precursor in the excited state. Such precursors are introduced as the supply source for film constituting elements into the film forming space to form the deposited films on the plural substrates 102. The flows of the gases on the respective substrates 102 are maintained in the same state by the apertures 103 of the substrate susceptor 101, by which the quality of the respective deposited films is made uniform.
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