| 摘要 |
PURPOSE:To stabilize discharge and to prevent generation of splash or its trace by providing an auxiliary partition plate having same potential as a partition plate near an orbit of a base plate to an opposite face side of the partition plate for a target. CONSTITUTION:In the inside of a chamber 1, auxiliary partition plates 6, 6 having same potential as a partition plate 4 are fitted via spacers 5 to respective faces of the partition plate 4 confronting targets 2, 2. The positioning of a cart 7 is preset without deviating for the partition plate 4. Voltage is impressed on the targets 2, 2 at a time point of a starting position of the cart 7 and sputtering is performed for the auxiliary partition plates 6, 6. This sputtering is stably performed by means of discharge reset based on the confronting interval l3 between the target 2 and the auxiliary partition plate 6. Then the cart 7 is transferred, and a base plate 8 is crossed in the discharge region in the confronting interval between the target 2 and the auxiliary partition plate 6. In this process, the fluctuating amount of the interval l1 between the target 2 and the confronting base plate 8 can be limited to a little.
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