METHOD AND DEVICE FOR TREATING SURFACE

摘要

PURPOSE:To effectively perform surface treatment such as film formation in favorable velocity by leading radiating light or an activated species caused by plasma of LTE discharge on the surface of a base material incorporated in a reaction vessel and performing prescribed treatment. CONSTITUTION:Discharge is caused in a discharge space 60 of the inside of a discharge tube 6 by impressing high-frequency voltage on a coil 2 in a discharge chamber 10. LTE plasma 3 is caused by introducing gas for discharge into the discharge tube 6 and making the impressed electric power large. Activated species 18 or radiating light 17 caused by this plasma 3 is introduced into a reaction chamber 20 through a meshy electrode 30. Reaction gas is introduced into an introduction ring 13 incorporated in the reaction chamber 20 and blown on the surface of a base material 16 through small holes 130 and fed in a reaction vessel 7, and surface treatment such as film formation or etching is performed on the base material 16.