| 摘要 |
PURPOSE:To obtain a magnetic head with an excellent magnetic characteristic at a high yield by forming a magnetic layer by an ion etching method using a batch twice and selectively removing a mask remaining after the 1st etching ends. CONSTITUTION:A magnetic thin film 6 is built up on an insulating layer 4 formed on a conductive layer 3. Next a resist pattern 7 in the desired shape of a magnetic layer is formed on the film 6, which is ion-etched. In that case it is etched by half its thickness. Then a resist pattern 8 is again patterned. In the consecutive ion etching, the resist pattern 8 is patterned so that a part around the gap part of the magnetic layer cannot be thin compared with other parts. The film 6 is ion-etched to form an upper magnetic layer 6. Such an inexpensive, high reliability magnetic head can be obtained at a high yield that employs a resist as an insulating layer and has a magnetic layer with an excellent magnetic characteristic. |
