发明名称 RADIATION SENSITIVE POSITIVE TYPE RESIST AND SUCH RESIST COMPOSITION
摘要 PURPOSE:To enhance sensitivity and to enable storage for a long term by using a copolymer made from specified 2 kinds of fluoroalkyl alpha-chloroacrylate. CONSTITUTION:The copolymer to be used for the resist is obtained by compolymerizing 2,2,2-trifluoroethyl alpha-chloroacrylate with 2,2,3,3-tetrafluoropropyl alpha-chloroacrylate in a weight ratio of 90:10-50:50. It is preferred for this copolymer to have an intrinsic viscosity of 0.5-2.0 in methyl ethyl ketone at 25 deg.C and a solution viscosity of 20-70cp obtained by dissolving it in methyl cellosolve acetate in a concentration of 5% at 25 deg.C. The resist composition is formed by dissolving this copolymer in a solvent composed essentially of methyl cellosolve acetate, and it is preferred to contain a radical inhibitor in this composition.
申请公布号 JPS62223750(A) 申请公布日期 1987.10.01
申请号 JP19860065898 申请日期 1986.03.26
申请人 TORAY IND INC 发明人 KATAOKA MUTSUO;TOKUNAGA ATSUTO
分类号 G03F7/039 主分类号 G03F7/039
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