| 摘要 |
A novel process for placing a thin film of a metal nitride, e.g. titanium nitride, on a glass substrate (10) by mixing a metal halide with a reducing gas like ammonia, preferably within a range of from about 250<o>C to 320<o>C, and then reacting the gases at (18) the surface of a glass substrate heated to, e.g., about 400<o>C to about 700<o>C to form the film on the glass. |
