发明名称 MICROWAVE PLASMA PROCESSING METHOD
摘要 PURPOSE:To effect more efficient plasma processings according to characteristics of works or contents of processings, by performing a plasma processing while a distance between a microwave transmitting window and a stage is varied. CONSTITUTION:A waveguide 11 is sealed by a microwave transmitting window 13 arranged vertically to the electric field of microwaves 12 travelling in the waveguide 11. A plasma processing is performed in a vacuum processing chamber 16 including a stage 15 for carrying a work 15 in opposition to the transmitting window 13. During this plasma processing, the distance (d) between the transmitting window 13 and the stage 15 is varied so that proportions of ions in the gas in the plasma state are varied to change the plasma, state essentially. In this manner, the plasma processing can be performed very efficiently in accordance with characteristics of the work 14 and the contents of the processing.
申请公布号 JPS62222639(A) 申请公布日期 1987.09.30
申请号 JP19860060913 申请日期 1986.03.20
申请人 FUJITSU LTD 发明人 FUJIMURA SHUZO;MOTOKI YASUNARI;KATO YOSHIKAZU
分类号 H01L21/302;H01L21/205;H01L21/3065;H01L21/31 主分类号 H01L21/302
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