发明名称 COMPOSITION OF TWO-STAGE CHEMICAL COPPER PLATING SOLUTION FOR TITANIUM MATERIAL
摘要 PURPOSE:To plate a Ti material with Cu in two stages in a short time by combining a preliminary plating soln. having a specified composition with a finish plating soln. having a specified composition. CONSTITUTION:The composition of a preliminary plating soln. is composed of, by weight, 10-20% Cu ion source enough to provide necessary Cu ions, 25-50% nitric acid, 5-10% hydrofluoric acid, 3-15% hypophosphorous acid, 0-4% acetic acid and the balance water. The composition of a finish plating soln. is composed of, by weight, 3-15% Cu ion source enough to provide necessary Cu ions, 5-30% nitric acid, 10-25% hydrofluoric acid, 2-10% hypophosphorous acid, 2-15% hydrogen peroxide, 0-4% acetic acid and the balance water. A Ti material is successively immersed in the preliminary plating soln. and the finish plating soln. to plate the surface of the Ti material with Cu.
申请公布号 JPS62222083(A) 申请公布日期 1987.09.30
申请号 JP19860065156 申请日期 1986.03.24
申请人 YOSHIZAWA KIKO TOUBU KK 发明人 SAITOU IHOE;MATSUZAWA HIROKAGE;TSURUGA TERUHISA;ORIHASHI TAKASHI
分类号 C23C18/38;C23C18/40 主分类号 C23C18/38
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