| 摘要 |
PURPOSE:To speedily and precisely inspect the defect of a fine pattern by scanning every chip in a scanning part which scans a single beam and counting pattern edges at every scanning line so as to compare them. CONSTITUTION:First, alignment is executed according to a reference mark, then, an electron beam irradiator 1 scans a chip A through an electron beam. A detector 2 detects a signal which is generated in the pattern part of said chip and an edge signal processing circuit 5 shapes said signal to generate a binarization signal. Based on the signal, a comparison data composition part 6 creates comparison data on the counted pattern edges per scanning line and stores them in a comparison memory 8. Next, a sample stage 4 is shifted and alignment is executed. Then, said radiator scans a chip B similarly, and detects the comparison data to store it in the comparison memory 8. A comparison decision part 7 compares the chips A and B at every scanning line to detect the presence or absence of the defect. |
