| 摘要 |
PURPOSE:To reduce the coating time and to continuously produce a strip coil product having various characteristics by providing an ion plating device and a sputtering device in series between two rewinding and winding devices. CONSTITUTION:The ion plating device 2 and the sputtering device 3 are arranged in series between the two rewinding and winding devices 1 in a vacuum vessel 4, and each site is evacuated to a specified vacuum by an exhauster P. The strip S rewound from the right rewinding and winding device 1 is wound on the left rewinding and winding device 1, and the strip is preheated by a preheater 7. A target 5 is heated, vaporized, and ionized in the ion plating device 2 to form a coated layer on the surface of the strip S. An inert gas introduced from an inlet 8 is ionized in an electric field in the sputtering device 3 and collided with a target 6 to sputter the atoms and molecules of the target 6, and a coated layer is formed on the surface of the strip S. The strip S is traveled, as required, in the opposite direction, and a desired coated film is formed.
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