| 摘要 |
A composition, adapted to strip photoresists from substrates after the protective function of the photoresist has been completed, comprises a mixture of (a) morpholine or an N-alkyl or N-hydroxyalkylmorpholine and (b) pyrrolidone or an N-alkyl or N-hydroxyalkylpyrrolidone in a ratio by weight of (a) to (b) of about 4:1 to about 0.25:1. The composition is effective in stripping, rapidly and completely, a wide variety of photoresists at room temperature or at elevated temperatures below the flash point of the composition. |
