| 摘要 |
PURPOSE:To prevent a membrane from being deformed and enable a high- accuracy pattern to be formed, by forming a protective layer, which has the stress nearly equal to that of X-ray absorbers, in a mask for X-rays so that opening parts generated by pattern formation are buried. CONSTITUTION:X-ray absorbers 2 are attached to a membrane 1 by plating or sputtering technique, and then a definite circuit pattern is formed by etching technique. 3 is a protective layer superior in X-ray transmitting rate which is formed so as to cover the X-ray absorbers 2, having the stress (b) nearly equal to that (a) of the X-ray absorbers 2. Since the stress (a) of the X-ray absorbers 2 and that (b) of the protective layer 3 are opposite in their directions and equal in their amount, they disappear in the form of internal forces. Therefore, because no stress occurs in the membrane 1, no deformation occurs there even if the membrane 1 is a few mum thick. Therefore use of this X-ray mask enables a super-fine circuit pattern to be formed with high precision. |
