发明名称 SPUTTERING DEVICE
摘要 PURPOSE:To increase the thickness of a target and to improve the using efficiency thereof with a sputtering device in which a ferromagnetic material is used as the target by forming the magnets of a target support into double layer construction. CONSTITUTION:One set of toric magnets magnetically coupled by a yoke 25 and toric magnets 23 magnetically coupled by another yoke 26 are made into the nesting construction to envelope the magnets 22 from the inside and outside peripheries to support the target 21 in the case of using the ferromagnetic material as the disk-shaped target 21 of the sputtering device. The exchange of the target 21 is thereby made easy and the target having a large thickness is made usable. The magnetic fields by the magnets 23 pass the inside of the target if the target is not saturated but the target is saturated and therefore, an arc-shaped magnetic field 24 is generated in the space on the surface thereof, by which magnetron sputtering is made possible and the entire surface of the target 21 is uniformly sputtered. The use efficiency thereof is thus improved.
申请公布号 JPS62218562(A) 申请公布日期 1987.09.25
申请号 JP19860061329 申请日期 1986.03.19
申请人 FUJITSU LTD 发明人 WAKAMATSU HIROAKI;KUME TOMIO;TSUCHIYA KAZUNORI;HATA KUNIO;KANDA HIDEKAZU
分类号 C23C14/34;C23C14/35;C23C14/36 主分类号 C23C14/34
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