发明名称 ION IMPLANTATION EQUIPMENT
摘要 PURPOSE:To reduce cleaning time of an electrode by arranging an earthed plate so as to be able to be taken out or put in the position opposed to an outgoing electrode while opening a gas lead-in port for introducing inert gas between the outgoing electrode, on which negative voltage is to be impressed, and the plate. CONSTITUTION:A plate 2 is moved to the position opposed to an outgoing electrode 3 while impressing voltage between the plate 2 and the outgoing electrode 3 so that the side of the electrode may be negative and opening a valve 5 of a gas lead-in port 4 to introduce inert gas. Then, the plate 2 is taken out for generating plasma between the plate 2 and the outgoing electrode 3 while making the ions of positively ionized inert gas to collide with atoms of impurities on the electrode surface to exfoliate and remove impurities from the electrode surface with its impact. During ordinary working hours, a valve 5 provided at the gas lead-in port 4 is closed and the plate 2 is made to retreat to a position not impeding an ion beam coming flying from an ion source 1. Thereby, cleaning time of the electrode can be sharply reduced.
申请公布号 JPS62217548(A) 申请公布日期 1987.09.25
申请号 JP19860060321 申请日期 1986.03.18
申请人 NEC CORP 发明人 HOSOKAWA KAZUNORI
分类号 H01L21/265;H01J37/08;H01J37/317 主分类号 H01L21/265
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