| 摘要 |
<p>In an apparatus for continuous plasma CVD deposition in and through a vacuum system (H), box carriers (10-l through 10-n) are provided to carry both the substrates (10-b, 10-c, 10-f, 10-g) and the plasma exciting electrodes (10-a, 10-d, 10-e) through the system.</p> |
