| 摘要 |
This invention relates to a mask (reticle) washing apparatus for use in the production of semiconductor integrated circuits (IC), and in particular, to cleaning a mask without the use of a strong oxidizing agent or a strong alkaline agent. The mask washing apparatus comprises an airtight chamber including a washing space and a drying space which are separated by a shutter. A drain and an exhaust duct are located at the bottom of the chamber. The washing is performed at a lower part of the chamber and the drying is performed at an upper part of the chamber. A clean air stream flows from the upper part to the lower part of the chamber, and this flow eliminates contamination in the chamber. Consequently, the mask is cleaned perfectly, and the reliability and yield of the device is improved.
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