发明名称 Optical thin film waveguide
摘要 An optical waveguide obtained by forming on a substrate an amorphous silicon film which contains a predetermined quantity of at least one of the elements of hydrogen, nitrogen and oxygen so that the amorphous silicon film has a predetermined value of refractive index. The optical waveguide can be made easily by carrying out a sputtering operation, in which Si is used as a target with a mixed gas of argon and at least one of hydrogen, nitrogen and oxygen, or a mixed gas of hydrogen and at least one of nitrogen and oxygen used as a sputtering gas, the composition of the sputtering gas being controlled in a predetermined manner during the sputtering operation.
申请公布号 US4695122(A) 申请公布日期 1987.09.22
申请号 US19850696478 申请日期 1985.01.30
申请人 HITACHI, LTD. 发明人 ISHIDA, KOJI;MATUMURA, HIROYOSHI
分类号 G02B6/13;G02B6/122;(IPC1-7):G02B6/12 主分类号 G02B6/13
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