| 摘要 |
PURPOSE:To produce a photosensitive resin having high sensitivity especially useful as a sensitized material for PS plate at low cost, by reacting a vinyl polymer containing a pendant group having formyl-cinnamic acid ester structure with a compound containing active methyl or methylene group. CONSTITUTION:(A) A vinyl polymer usually containing >=0.5mol based on 1,000g polymer of a pendant group having formylcinnamic acid ester structure [preferably structure shown by the formula OR is H or CN)] is reacted with (B) 1-1.5 equivalent based on 1 equivalent formylcinnamic acid ester structure unit of an active methyl group-containing compound (e.g. nitrogen-containing heterocyclic compound, acetophenone, pyrylium salt, etc.) or active methylene group- containing compound (e.g. malonic acid, cyanoacetic acid, rhodanine, etc.) usually at <=130 deg.C to give the aimed resin. |
