| 摘要 |
PURPOSE:To obtain a resist for exposure to X-rays having high sensitivity, resistance to dry etching, and high definition by mixing superfine particles having high absorption coefft. for soft X-rays, with a high molecular material sensitive to X-rays. CONSTITUTION:A resist is prepd. by mixing superfine metal particles having high absorption coefft. for soft X-rays, such as Pb, Cr or Al with a high molecular material sensitive to X-rays, such as polymethyl methacrylate, polyisobutylene, etc. When the X-ray resist is irradiated with X-rays, secondary selectrons are emitted from the superfine metal particles, and the sensitivity is increased. Since the resist is superfine particle, the resistance to dry etching is improved. |
