摘要 |
An imaging system for focusing and deflecting an electron beam comprises, as in prior systems, an evacuated envelope structure having a longitudinal axis and a solenoid for generating a substantially uniform magnetic field within the envelope and along the longitudinal axis thereof. As in prior systems of this type, the envelope includes an electrostatic yoke therein for generating a variable substantially uniform electric field within the envelope to deflect the electron beam along two coordinates of the system. The electric field is orthogonal to the magnetic field. An electron gun within the envelope generates and directs the electron beam through the magnetic and electric field to a target located opposite the electron gun and in a plane perpendicular to the axis of the tube. Unlike prior systems, the electrostatic yoke of the present system comprises a first conductive layer bonded to the interior surface of the envelope, and a second conductive layer overlying the first conductive layer. The first conductive layer has a thickness in the range of about 500 to 1000 ANGSTROM and the second conductive layer has a thickness in the range of about 800 to 1500 ANGSTROM . The first and second layers include two pairs of interleaved electrodes. A method of making the electrostatic deflection yoke is also disclosed.
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