发明名称 PLASMA ASHING APPARATUS
摘要 PURPOSE:To vary to a barrel type or down-flow type ashing apparatus by providing a plate between a microwave transmitting window and a wafer, and driving it. CONSTITUTION:A microwave generator 11 and a chamber 13 for introducing ashing gas 12 have plasma generating means made of a microwave transmitting window 15 for introducing microwave 14 into a chamber. A plurality of plates having a plurality of holes 20 are provided between the window 15 and a wafer which is coated with resist 16, the plates 18 are driven to control the flow of a plasma 19 which arrives from the window 15 on the wafer 17. Thus, the flow of the plasma is interrupted or passed to readily convert to a down-flow type ashing apparatus of a barrel type ashing apparatus.
申请公布号 JPS62216329(A) 申请公布日期 1987.09.22
申请号 JP19860058051 申请日期 1986.03.18
申请人 FUJITSU LTD 发明人 YANO HIROSHI;SAITO TSUTOMU
分类号 H01L21/30;H01L21/027;H01L21/302;H01L21/3065 主分类号 H01L21/30
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