发明名称 MICROWAVE PLASMA PROCESSOR
摘要 PURPOSE:To equalize the processing speeds of the surface of a workpiece to be processed between the center and the periphery by forming the shape of a waveguide for introducing a microwave at the bonding portion of a vacuum vessel in a tapered state, and uniformizing the generation of a plasma by the microwave. CONSTITUTION:The shape of a waveguide is a tapered tube. That is, a waveguide 2a is formed to have a shape including a tapered portion T matched to the outer diameter of a vacuum vessel 1 to equalize the transmission of a microwave from a window material 3. Accordingly, the initial processing time t0 near the center and the processing times t1, t2 at the periphery have almost no difference, substantially simultaneously processed to process it in a uniform time distribution. In this case, the difference of the transmitting power of the microwave due to the taper at between the center and the periphery is no problem in practical use, and mode is not disordered. Since the tapered portion is matched to the outer diameter of the vessel 1, the entire surface can be uniformly processed, for example, even in the process of the wafer.
申请公布号 JPS62216334(A) 申请公布日期 1987.09.22
申请号 JP19860058232 申请日期 1986.03.18
申请人 FUJITSU LTD 发明人 FUJIMURA SHUZO;MOTOKI YASUNARI
分类号 H01L21/205;C23F4/00;H01L21/302;H01L21/3065;H01L21/31 主分类号 H01L21/205
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