ETCHING LIQUID FOR SILICON

摘要

PURPOSE:To enable etching flat surface silicon in a comparatively short time by adding polyoxyethylene alkyl ether [RO(CH2CH2O)nH] to saturated ammonia water. CONSTITUTION:An etching liquid 1 wherein polyoxyethylene alkyl ether [RO (CH2CH2O)nH] is added to saturated ammonia water is used. The polyoxyethylene alkyl ether permeates the etching liquid inside an etched groove and since the polyoxyethylene alkyl ether is perfectly dissolved in a solution, it does not remain on the etching surface of a silicon substrate 2 and no etching irregularity is made. This enables containing a flat etching surface and an etching speed is improved.