| 摘要 |
PURPOSE:To prevent the generation of abnormal discharge and to efficiently form a deposited film of uniform and good film quality on the surface of a substrate by disposing a conductor on the central axis of a cylindrical reaction vessel, and energizing the conductor, thereby forming circular concentrical magnetic lines of force. CONSTITUTION:The inside of the cylindrical reaction vessel 1 is evacuated to a vacuum and the cylindrical substrate 7 is heated and held to and at a prescribed temp. by a heater 8. A gaseous raw material is then introduced through an introducing pipe 10 into the reaction vessel 1 from a gas releasing pipe 2'a of the inside wall 2' toward the substrate surface; at the same time, the high frequency from a voltage impressing means 14 is impressed between a cathode electrode 2 and the substrate (anode electrode) 7 to generate plasma discharge. The conductor 15 is disposed on the central axis of the reaction vessel 1 and electric current is caused to flow thereto to form a spiral magnetic field along the surface of the substrate 7. The generation of the abnormal discharge between the cathode electrode 2 and an upper wall 3 or bottom wall 4 is thereby prevented and the plasma control near the substrate surface is executed. The excellent deposited film is thus formed. |
