发明名称 CHARGED BEAM DEVICE
摘要 PURPOSE:To enable three dimensional measurement, observational analysis and machining of fine portions, film formation, transportation of substances, etc. by using a liquid metallic chip in place of a metallic chip used till now as an electron emission source, applying voltage positive or negative as required to a sample and obtaining a fine electron or ion probe. CONSTITUTION:A liquid metallic ship 6 is formed so that a needle-shaped metallic chip 5 may be connected with a support element 4 to constitute a framework and immerged in liquid metal (raw material) 1 with itself positioned at the center of the framework. When an electrode structure is set in a condition of close proximity of the liquid metallic chip 6 to a sample 2 and connected to a power source 3, a fine ion probe can be obtained by field emission phenomenon. The clearance between the chip 6 and the sample 2 is preferably about 10Angstrom -100Angstrom .
申请公布号 JPS62213052(A) 申请公布日期 1987.09.18
申请号 JP19860054728 申请日期 1986.03.14
申请人 HITACHI LTD 发明人 HOSAKA SUMIO;TAMURA HIFUMI;HOSOKI SHIGEYUKI;AIDA TOSHIYUKI;HARADA TATSUO
分类号 H01J37/073;G01Q30/02;G01Q60/00;H01J37/08;H01J37/28;H01J37/30 主分类号 H01J37/073
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