发明名称 ELECTROLYTIC CELL FOR ELECTROPLATING OF ALLOY
摘要 PURPOSE:To make an alloy compsn. uniform in the depth direction of a plating layer by providing plural flow regulating plates spaced from each other between electrodes and a strip so as to face the traveling direction of the strip to prevent the variance in the flow rate of plating bath jets. CONSTITUTION:The strip 1 is run between the electrodes 2 and 3 and the plating baths are gushed between the strip 1 and the electrodes 2, 3 from gushing headers 4, 5, by which the strip 1 is electroplated with the alloy. The plural flow regulating plates spaced from each other are provided between the electrodes 2, 3 and the strip 1 in the direction where the plates face the traveling direction of the strip 1. The plating bath jets which are emitted from the headers 4, 5 and flow in the direction opposite therefrom, therefore, flow between the top ends of the flow regulating plates 6 and the strip 1 and the blocking of the flow by the top ends of the plates 6 and the spread in the direction between the strip and the electrodes are obviated. The performance of the plating film is thus stabilized.
申请公布号 JPS62211399(A) 申请公布日期 1987.09.17
申请号 JP19860051509 申请日期 1986.03.11
申请人 NIPPON KOKAN KK <NKK> 发明人 TSUJIHARA TOSHIYUKI;ANAMI TATSURO;NAMATAME MASARU;YOSHIOKA OSAMU;SAKAMOTO NORIHIKO
分类号 C25D3/56;C25D7/06;C25D21/10 主分类号 C25D3/56
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