Method of aligning a mask and a substrate relative to each other and arrangementfor carrying out the method.

摘要

A method and an arrangement are described for aligning relative to each other a mask pattern (C) and a substrate (W) which are both provided with two alignment marks. By the use of two separate alignment systems (AS,, AS2) which are each associated with one mask mark (M1, M2) and which are each used for aligning the substrate marks (P1, P2) relative to said mask marks the substrate (W) and the mask (M) can be aligned accurately without referring to the frame of the exposure apparatus, whilst in addition it is possible to detect any signification errors.