发明名称 |
Electrical isolation and leveling of patterned surfaces |
摘要 |
In the fabrication of micro-electronic circuits, it is often necessary to arrange a number of patterned surfaces be well insulated from each other. At the same time, however, the pattern edges of the layer to be overlaid must present a defined slope angle of between the range of forty to sixty degrees, for example. The invention solves this problem through a two stage coating process in which a polymer is first applied which coats the edges and is then coated with a photoresist having good leveling properties.
|
申请公布号 |
US4693780(A) |
申请公布日期 |
1987.09.15 |
申请号 |
US19850808144 |
申请日期 |
1985.12.12 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT |
发明人 |
BEIL, GERHARD;PICHLER, ALFRED;PACHONIK, HORST;PLEHNERT, KURT |
分类号 |
H01L21/312;H01L21/768;H01L23/522;H01L23/532;H05K3/28;H05K3/46;(IPC1-7):H01L21/312 |
主分类号 |
H01L21/312 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|