发明名称 Electrical isolation and leveling of patterned surfaces
摘要 In the fabrication of micro-electronic circuits, it is often necessary to arrange a number of patterned surfaces be well insulated from each other. At the same time, however, the pattern edges of the layer to be overlaid must present a defined slope angle of between the range of forty to sixty degrees, for example. The invention solves this problem through a two stage coating process in which a polymer is first applied which coats the edges and is then coated with a photoresist having good leveling properties.
申请公布号 US4693780(A) 申请公布日期 1987.09.15
申请号 US19850808144 申请日期 1985.12.12
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 BEIL, GERHARD;PICHLER, ALFRED;PACHONIK, HORST;PLEHNERT, KURT
分类号 H01L21/312;H01L21/768;H01L23/522;H01L23/532;H05K3/28;H05K3/46;(IPC1-7):H01L21/312 主分类号 H01L21/312
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