| 摘要 |
PURPOSE:To work an annealing region precisely by forming a mask with an opening limiting the width of the cross section of beams in an electron beam path, the electron-beam cross section of which is formed linearly, and image- forming linear electron beams onto a sample by a projection electron lens. CONSTITUTION:A linear source 21 formed by an electron gun constituted of a linear cathode 1, a Wehnelt electrode 2, an anode 3, etc. in a tube 7 is image- formed as linear beams 22 at the position of a mask 9 by a first electron lens 5. The linear beams 22 in size larger than the width of an opening 10 are limited by the opening 10 for the mask 9, emitted as linear beams in prescribed size, and image-formed and projected into a predetermined region on a sample 11 as linear beams 23 in desired size by a second electron lens 15 for projection. A holder 12 supporting the sample 11 is shifted by a drive system 13, and fixed regions in the sample 11 are annealed accurately in succession.
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