| 摘要 |
PURPOSE:To obtain satisfactory definition by forming a lower layer comprising a resist layer of a material which is insoluble in the solvent for an upper resist layer. CONSTITUTION:A resist layer 2 as an a lower layer is formed by coating polydiaryl orthophthalate type resist on the surface of a substrate 1 to be processed, and the resist layer 2 is solidified by irradiating with far ultraviolet rays 3. Then, a resist layer 4 as an upper layer using methyl isobutyl ketone as solvent is formed on the resist layer 2. As the result, the layer 2 and the layer 4 are not mixed with each other, and easily removable two layered pattern is formed. |
