ANLEGGNING FOR KONTINUERLIG AVSETTNING PA ETT UNDERLAG, SASOM EN GLASPLATTA, AV EN FAST BELEGGNING ERHALLEN AV MINST TVA REAKTANTER I GASFAS

摘要

The apparatus comprises a nozzle (2) having three converging tuyeres (3, 4, 5) which project the reagents (SnCl4 and H2O) in the gaseous phase onto the substrate to be plated. Deflector members (6a, 6b), which are adapted to channel the gases between themselves and the substrate, extend on either side of the nozzle (2). The surface (51) of the deflector member (12) which extends in the opposite direction to the direction of movement of the substrate with respect to the nozzle is parallel to the substrate, and the edge (53) which it forms at an acute angle with the extended external wall (5b) of the third tuyere (5) is transversely offset in the direction of the said movement with respect to the axial median plane of the tuyere (3). On the other hand, the surface (52) of the second deflector member (5a) forms a blunt edge (54) with the corresponding longitudinal wall (4b) of the second tuyere. The opening of the nozzle between the edges (53, 54) is therefore effectively bent and the gases emerging therefrom are regularly deflected in the direction of movement of the substrate.