摘要 |
PURPOSE:To correct the shear of a beam irradiating position due to the distortion or the like of an optical system and to improve drawing accuracy by previously measuring the shearing values of beams from plural positions of a sample stage in the X direction. CONSTITUTION:When a sample 20 is scanned by laser beams in the X direction on the basis of the rotation of the polygon mirror and the blanking control of the beams is executed in accordance with pattern data to be drawn while continuously moving a sample stage 19 mounting the sample 20 in the Y direction, a required pattern can be drawn on the sample 20. In this case, correction data relating to the distortion of an optical system are found out by beam scanning to a pitch sensor 29, the calculation of a correction value DELTAX, the operation of linear interpolation, etc., previously stored in a memory and then corrected by an AOD14 at the time of practical drawing. Consequently, the shear of a beam irradiating position due to the distortion of the optical system can be surely suppressed. |