发明名称 METHOD FOR GAS ETCHING
摘要 PURPOSE:To prevent consumption of electric power according to frequency conversion by generating glow discharge via a device having voltage trailing characteristics without using an oscillator even if using a commercial electric power source. CONSTITUTION:Electric power supplied from a commercial electric power source 1 is fed to a reaction chamber 3 via a leakage transformer 2 wherein commer cial voltage is risen until voltage required to glow discharge without converting frequency and also stabilized discharge is obtained by voltage trailing character istic. In other words, when discharge is started between a dummy base body 5 for etching and an electrode plate 4 for glow discharge, current is allowed to flow by using this leakage transformer 2. In such a case that voltage is reduced according to increase of current, when reduced until some degree, the prescribed amount of electric power is stationarily fed and a discharge state for stable etching can be maintained. In such a way, electric power sup plied from the commercial electric power source 1 can be effectively fed.
申请公布号 JPS62202088(A) 申请公布日期 1987.09.05
申请号 JP19860044971 申请日期 1986.02.28
申请人 KYOCERA CORP 发明人 IWASAKI KAGENORI;HIGUCHI HISASHI
分类号 C23F4/00 主分类号 C23F4/00
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