| 摘要 |
PURPOSE:To excellently measure the position of the substrate stage to a mask at all times without being affected by the positional primary factors of a carriage in the projection and exposure device of step-and-scan system by a method wherein a member, with which the interference part of the interferometer, to be used to measure the position of the stage, is provided on the member which integrally conveys an original sheet and the material to be exposed. CONSTITUTION:When the first shot exposure is going to be conducted, first, a mask 1 is positioned to the mask reference mark on the side of a device using a microscope. Subsequently, the positioning marks of the mask 1 and a substrate 3 are measured using the microscope, the mask 1 and the substrate are positioned, and the first shot exposure is conducted. Then, when the second shot exposure and the following exposures are going to be performed, the substrate 3 is step-shifted accurately so that the substrate 3 will be set at the prescribed position while the position of the stage 4, on which the substrate 3 is mounted, is being measured using the laser interferometer composed of a laser tube 14, a scoyer 15 and an interference part 16.
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