| 摘要 |
PURPOSE:To enable a vertical magnetizing film to lower the coercive force Hcp in a vertical direction, and to obtain a vertical magnetic recording medium possible to easily control the Hcp, by impressing a DC magnetic field on a substrate plane in the vertical direction, and forming the vertical magnetizing film containing Co and Cr as essential components on a substrate with a magnetron sputtering method. CONSTITUTION:In a magnetron sputtering device consisting of a target 1, an electrode 2, a magnet 3, an earth electrode 4, and a substrate 6, the DC magnetic field is impressed on the substrate 6 in the vertical direction through a DC magnetic field coil 5. While the above state is being kept, the vertical magnetizing film containing Co and Cr as the essential components is formed on the substrate 6. In this way, the coercive force Hcp of the vertical magnetizing film in the vertical direction can be lowered, and also, the Hcp can be controlled easily.
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