| 摘要 |
PURPOSE:To form a surface of a cell layer into a dense plane to prevent gases of impurities such as water or the like from being absorbed, by firing the cell layer at a process temperature higher than the conventional one for firing the cell layer at which the surface of a dielectric layer becomes molten. CONSTITUTION:A material, which is formed by mixing a low gamma material such as Al2O3, a crystalline glass of low melting point, a coloring agent comprising cobalt trioxide for enhancing the contrast of a discharge-display, is used to forma cell layer 24 on a dielectric layer 23. Thereafter, this cell layer 24 is fired at a process temperature higher than the firing temperature of the cell layer at which the surface of the dielectric layer 23 becomes molten, for example, at 510 deg.C or so in case that the conventional firing temperature of the cell layer is 440 deg.C and that of the cell layer 23 is 570 deg.C. Thus, because, the whole surface of the cell layer is covered with a glass film 23 caused by dissolution in a part of the molten dielectric layer 23 and becomes dense, gases of impurities such as water carbon dioxide and the like can be prevented from being absorbed. |
