| 摘要 |
PURPOSE:To obtain a superior sensitive body free from film defects by exposing a support to plasma of gaseous silicon fluoride such as SiF4 generated by glow discharge immediately before a photosensitive layer is deposited on the support. CONSTITUTION:An electrically conductive support 1 is set in a vacuum vessel, the vessel is evacuated, the support 1 is heated, gaseous starting material is introduced into the vessel and glow discharge is started. During the time, dust sticks to the surface of the support 1 and most of the dust is a polymeric compound consisting of silicon and hydrogen, so the support 1 is exposed to plasma of gaseous silicon fluoride such as SiF4 generated by glow discharge to completely decompose and remove the polymeric compound. A photosensitive layer is then deposited on the resulting clean surface of the support 1 having little dust by glow discharge. Thus, a superior sensitive body free from film defects is obtd. |
