发明名称 LEAK-FREE ETCHED TEFLON FLOW SPACERS FOR ELECTRODIALYSIS APPARATUS AND A METHOD FOR THE MAKING THEREOF
摘要 <p>An improved electrodialysis stack (10) and method of making the same wherein the border surface areas (46, 48, 50) of the flow spacer frames (26, 28, 30) are conditioned by chemical etching, the peripheral inner edges of the frame border are machined smooth, the etched border surface areas are coated with a thin layer of inert grease such as silicone, and placed under pressure with other electrodialysis components to form a closed system closely packed and essentially solid stack which is free from cross leakage between compartments (12, 16, 20) and seepage therefrom.</p>
申请公布号 IL81341(D0) 申请公布日期 1987.08.31
申请号 IL19870081341 申请日期 1987.01.21
申请人 MORTON THIOKOL, INC.;GERALD A. KRULIK 发明人
分类号 B01D61/00;B01D61/50;B01D63/08;(IPC1-7):B01D/ 主分类号 B01D61/00
代理机构 代理人
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