| 摘要 |
PURPOSE:To simplify the view field finding work, by mark-displaying the observed positions through electron beam scanning depending on signals to display the inclination, movement, and the rotation angle of a sample, overlapping on the object view field image. CONSTITUTION:When a sample is inclined at an angle thetat by a push button on a scanning table 20, and the surface J of a wafer is apart at z from the the surface S, the positioning directly under the optical axis is moved in the -X direction at ztanthetat, and the rectangular mark displayed on the graphic display CRT 15 is shown at the position M. Then by handling the push button 20 to drive an X, Y movement mechanism 3, and moving the sample in the X, Y direction, the center coordinate of the rectangular mark M is moved depending on the signal operated in a movement arithmetic unit 18a, and as a result, the rectangular mark M displayed on the CRT 15 is moved to the position responding to the point A. Then, the surface of the point A of the wafer W arranged directly under the optical axis is scanned by the electron beam 6, and the image at the point A is displayed on a display CRT 12 to be observed. Therefore, the view field setting can be secured simply.
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