| 摘要 |
PURPOSE:To perform a lamp irradiation on a number of wafers simultaneously by a method wherein the wafers are erected in a cylindrical quartz tube, and the space per sheet is reduced. CONSTITUTION:Ring-like halogen lamps 1 are mounted on the circumference of a quartz tube 4, the distance between each halogen lamp and the distance from the quartz tube 3 are selected properly taking into consideration of a heating region and the speed of temperature rise. A reflection plate 2 emits light and heat uniformly toward the center of the quartz tube 3 by reflecting the light seat from the halogen lamps 1. The light made incident on the center of the quartz tube 3 is uniformly made to irradiate on the wafer surface located in the quartz tube 3. At this time, the wafers are arranged inclining to axial direction or vertical direction of the quartz tube 3 leaving proper intervals between them so that the surface of the wafers can receive the light sent from the tungsten halogen lamps 1 uniformly. |
