| 摘要 |
PURPOSE:To obtain the titled material having a good sensitivity and excellent anti-heating and anti-dry etching properties by constituting the titled material from a copolymer composed of a compd. having sulfophenyl isopropene group and qinone diazide group bound to an aromatic ring as an essential component of the polymerizable monomer. CONSTITUTION:The titled material is constituted of the copolymer which includes, as a essential component, the compd. having sulfophenylisopropene group and quinone diazide group bound to the aromatic ring, for example, the polymerizable monomer having a molecular structure of sulfonic acid ester obtd. by reacting sulfonic acid group or its derivative group contd. in the compd. contg. quinone diazide group with a hydroxy group of isopropenyl phenol. The prescribed copolymer has preferably the weight average mol. wt. (MW) of 2000-100000. If the prescribed mol. wt. (MW) is <1000, the glass transition point (Tg) falls, and the heat-resistance is insufficient. If the prescribed MW is >500000, the sensitivity and the film forming property fall due to the reduction of solubility rate for the developer. |
